The spectrum extends from magnetron sputtering units operating on the principle of cathode atomisation with sputter electrodes to modular systems equipped with a pulsed-laser deposition (PLD) system and used for the production and analysis of super-thin films such as cuprate supraconductors, layered manganates, heteroepitactic hybrid structures and metallic thin films.
Production of X-ray mirrors with extra-low scatter: process chamber of a PINK UHV cluster tool device with pulsed-laser deposition on which multi-layer films can be generated with an extremely low roughness of only approximately a tenth of a nanometre. (Image: Fraunhofer Institute for Material and Beam Technology (IWS)
